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Other articles related with "inductively coupled plasma (ICP)"：
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75203 |
Zhen-Hua Bi(毕振华), Yi Hong(洪义), Guang-Jiu Lei(雷光玖), Shuai Wang(王帅), You-Nian Wang(王友年), Dong-Ping Liu(刘东平) |
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Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics |
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Chin. Phys. B
2017 Vol.26 (7): 75203-075203
[Abstract]
(832)
[HTML 1 KB]
[PDF 1566 KB]
(185)
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37201 |
Lei Wang(王磊), Jiaqi Zhang(张家琦), Liuan Li(李柳暗), Yutaro Maeda(前田裕太郎), Jin-Ping Ao(敖金平) |
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Plasma-assisted surface treatment for low-temperature annealed ohmic contact on AlGaN/GaN heterostructure field-effect transistors |
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Chin. Phys. B
2017 Vol.26 (3): 37201-037201
[Abstract]
(688)
[HTML 1 KB]
[PDF 311 KB]
(338)
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